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Plasma

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Category: Atomsphere Plasma

Changzhou Wellsin-Semi Equipment Co., Ltd. was established by an international talent team. Aiming at the wide application of ultrasonic technology and plasma technology in the semiconductor and microelectronics fields, it is committed to the development and sales of semiconductor-specific ultrasonic and plasma equipment, and cooperates with the Chinese Academy of Sciences, R&D cooperation with research institutes and other institutes to provide the industry with high-quality products and services.

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Product Details

Product introduction

Using atmospheric cold plasma technology, Wellcore Semiconductor’s atmospheric plasma equipment can effectively remove metal and non-metal oxide films or organics, with high cleaning efficiency, and is widely used in wafer photoresist removal, glass surface cleaning, and The surface of the lead frame is cleaned.

Product details

Innovative technology

Contrast before and after glass treatment

Contrast before and after copper treatment

Product configuration table

Model	APM-1	APM-100
Processing width	1mm	100mm
RF frequency	13.56/27.12MHZ	13.56/27.12MHZ
RF power	300W	300W
RF matching	Automatic	Automatic
Main gas	Argon/Helium	Argon/Helium
Main gas flow rate	~30L/min	~30L/min
Process gas	Nitrogen/Oxygen/Hydrogen	Nitrogen/Oxygen/Hydrogen
Process gas flow rate	0.1~5L/min	0.1~5L/min
Best working distance	2~5mm	2~5mm
Power input	220V	220V